Title of Research Project
Modulated Hydrothermal Synthesis and Optimization of Hf/Zr-Fumarate Metal-Organic Frameworks
Major
Chemistry
Research Abstract
Water-stable Hf/Zr-Fumarate (FMA) metal-organic frameworks (MOFs) are highly promising for gas separation because of their postulated small pore size compared to other UiO-66-type MOFs and the low cost of fumaric acid. However, the efficient synthesis of these MOFs remains a big challenge. A mild, green, scalable modulated hydrothermal (MHT) method was applied for the synthesis of these MOFs. Specifically, acetic acid (AA), formic acid (FA), and trifluoroacetic acid (TFA) were used as the modulators. Various water to modulator solvent ratios were studied to investigate the effects of modulators on surface area and gas uptake properties. The MHT synthesized Hf/Zr-FMA MOFs displayed excellent hydrothermal stability, high surface area, high working capacity, and CO2 selectivity.
Faculty Mentor/Advisor
Dr. Claire Castro, Dr. William Karney
Included in
Modulated Hydrothermal Synthesis and Optimization of Hf/Zr-Fumarate Metal-Organic Frameworks
Water-stable Hf/Zr-Fumarate (FMA) metal-organic frameworks (MOFs) are highly promising for gas separation because of their postulated small pore size compared to other UiO-66-type MOFs and the low cost of fumaric acid. However, the efficient synthesis of these MOFs remains a big challenge. A mild, green, scalable modulated hydrothermal (MHT) method was applied for the synthesis of these MOFs. Specifically, acetic acid (AA), formic acid (FA), and trifluoroacetic acid (TFA) were used as the modulators. Various water to modulator solvent ratios were studied to investigate the effects of modulators on surface area and gas uptake properties. The MHT synthesized Hf/Zr-FMA MOFs displayed excellent hydrothermal stability, high surface area, high working capacity, and CO2 selectivity.
Comments
This research was conducted at the National University of Singapore through the ACS IREU program under the direction of Dr. Dan Zhao and Zhigang Hu.